December 3, 2020

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The History of Electron-beam Technology

The History of Electron-beam Technology
Author : Rointan F. Bunshah
Publisher : Unknown
Release Date : 1961
Category : Electron beams
Total pages :30
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Electron Beam Welding

Electron Beam Welding
Author : H Schultz
Publisher : Elsevier
Release Date : 1994-01-01
Category : Technology & Engineering
Total pages :240
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Translated from the German, this is a practical book for engineers which explains the trials, development and manufacturing processes involved in electron beam welding.

Clinical Applications of the Electron Beam

Clinical Applications of the Electron Beam
Author : Norah Duv Tapley
Publisher : Krieger Publishing Company
Release Date : 1982
Category : Medical
Total pages :274
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There has been an explosion in the knowledge, techniques, and clinical application of radiology in all of its specialities. This book describes the uses of the high-energy electron beam in the treatment of cancer. The author uses actual clinical histories and documents, including photographs.

Introduction to Electron Beam Technology

Introduction to Electron Beam Technology
Author : Robert A. Bakish
Publisher : Unknown
Release Date : 1962
Category : Electron beams
Total pages :452
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Laser and Electron Beam Processing of Materials

Laser and Electron Beam Processing of Materials
Author : C.W. White
Publisher : Elsevier
Release Date : 2012-12-02
Category : Technology & Engineering
Total pages :788
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Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.

Electron-Beam Interactions with Solids

Electron-Beam Interactions with Solids
Author : Maurizio Dapor
Publisher : Springer
Release Date : 2003-07-03
Category : Science
Total pages :110
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The interaction of an electron beam with a solid target has been studied since the early part of the past century. Since 1960, the electron–solid interaction hasbecomethesubjectofanumberofinvestigators’workowingtoitsfun- mental role in scanning electron microscopy, in electron-probe microanalysis, in Auger electron spectroscopy, in electron-beam lithography and in radiation damage. The interaction of an electron beam with a solid target has often been investigated theoretically by using the Monte Carlo method, a nume- cal procedure involving random numbers that is able to solve mathematical problems. This method is very useful for the study of electron penetration in matter. The probabilistic laws of the interaction of an individual electron with the atoms constituting the target are well known. Consequently, it is possible to compute the macroscopic characteristics of interaction processes by simulating a large number of real trajectories, and then averaging them. The aim of this book is to study the probabilistic laws of the interaction of individual electrons with atoms (elastic and inelastic cross-sections); to - vestigate selected aspects of electron interaction with matter (backscattering coe?cients for bulk targets, absorption, backscattering and transmission for both supported and unsupported thin ?lms, implantation pro?les, seconda- electron emission, and so on); and to introduce the Monte Carlo method and its applications to compute the macroscopic characteristics of the inter- tion processes mentioned above. The book compares theory, computational simulations and experimental data in order to o?er a more global vision.

Electron Beam Technology

Electron Beam Technology
Author : Siegfried Schiller,Ullrich Heisig,Siegfried Panzer
Publisher : John Wiley & Sons
Release Date : 1982
Category : Electron beams
Total pages :508
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Instabilities of Relativistic Electron Beam in Plasma

Instabilities of Relativistic Electron Beam in Plasma
Author : Valery B. Krasovitskii
Publisher : Nova Publishers
Release Date : 2008
Category : Science
Total pages :219
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This book is devoted to the non-linear theory of the collective interaction between a modulated beam of relativistic charged particles and narrow electromagnetic and Langmuir wave packets in plasma or gas slow-wave systems. Regular oscillations excited by a relativistic beam under the conditions of Cherenkov resonance and the anomalous Doppler effect can be used to generate coherent microwave radiation and accelerate charged particles in plasma.

Ultraviolet and electron beam (UV/EB) cured coatings, inks and adhesives

Ultraviolet and electron beam (UV/EB) cured coatings, inks and adhesives
Author : Anonim
Publisher : DIANE Publishing
Release Date : 2020
Category :
Total pages :129
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High Voltage Environmental Applications Inc. Electron Beam Technology

High Voltage Environmental Applications Inc. Electron Beam Technology
Author : Anonim
Publisher : Unknown
Release Date : 1997
Category : Electron beams
Total pages :52
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Electron Beam Microanalysis

Electron Beam Microanalysis
Author : Anonim
Publisher : ASTM International
Release Date : 2020
Category :
Total pages :129
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Electron Beam Pasteurization and Complementary Food Processing Technologies

Electron Beam Pasteurization and Complementary Food Processing Technologies
Author : Suresh Pillai,Shima Shayanfar
Publisher : Elsevier
Release Date : 2014-11-28
Category : Technology & Engineering
Total pages :352
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Food safety is a constant challenge for the food industry, and food irradiation technology has developed significantly since its introduction, moving from isotope irradiation to the use of electron beam technology. Electron Beam Pasteurization and Complementary Food Processing Technologies explores the application of electron beam pasteurization in conjunction with other food processing technologies to improve the safety and quality of food. Part one provides an overview of the issues surrounding electron beam pasteurization in food processing. Part two looks at different thermal and non-thermal food processing technologies that complement irradiation. Finally, a case study section on the commercial applications of e-beam processing provides examples from industry.

A System for Electron-beam Melting

A System for Electron-beam Melting
Author : Anonim
Publisher : Unknown
Release Date : 1964
Category : Electron beams
Total pages :35
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Electron Beam Analysis of Materials

Electron Beam Analysis of Materials
Author : M. H. Loretto
Publisher : Springer Science & Business Media
Release Date : 2012-12-06
Category : Juvenile Nonfiction
Total pages :210
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The examination of materials using electron beam techniques has developed continuously for over twenty years and there are now many different methods of extracting detailed structural and chemical information using electron beams. These techniques which include electron probe microanalysis, trans mission electron microscopy, Auger spectroscopy and scanning electron microscopy have, until recently, developed more or less independently of each other. Thus dedicated instruments designed to optimize the performance for a specific application have been available and correspondingly most of the available textbooks tend to have covered the theory and practice of an individual technique. There appears to be no doubt that dedicated instru ments taken together with the specialized textbooks will continue to be the appropriate approach for some problems. Nevertheless the underlying electron-specimen interactions are common to many techniques and in view of the fact that a range of hybrid instruments is now available it seems appropriate to provide a broad-based text for users of these electron beam facilities. The aim of the present book is therefore to provide, in a reasonably concise form, the material which will allow the practitioner of one or more of the individual techniques to appreciate and to make use of the type of information which can be obtained using other electron beam techniques.

Electron-Beam Technology in Microelectronic Fabrication

Electron-Beam Technology in Microelectronic Fabrication
Author : George Brewer
Publisher : Elsevier
Release Date : 2012-12-02
Category : Technology & Engineering
Total pages :376
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Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.