November 28, 2020

Download Ebook Free Handbook Of Sputter Deposition Technology

Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology
Author : Kiyotaka Wasa,Isaku Kanno,Hidetoshi Kotera
Publisher : William Andrew
Release Date : 2012
Category : Science
Total pages :644
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Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology
Author : Shigeru Hayakawa
Publisher : William Andrew Publishing
Release Date : 1992-01-01
Category : Reference
Total pages :304
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A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author : Peter M. Martin
Publisher : William Andrew
Release Date : 2009-12-01
Category : Technology & Engineering
Total pages :936
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This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
Author : D. M. Mattox
Publisher : Cambridge University Press
Release Date : 2014-09-19
Category : Technology & Engineering
Total pages :944
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This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author : Rointan Framroze Bunshah
Publisher : William Andrew
Release Date : 1994
Category : Reference
Total pages :861
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This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon

Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon
Author : Krishna Seshan
Publisher : CRC Press
Release Date : 2002-02-01
Category : Technology & Engineering
Total pages :72
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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Handbook of Thin Film Technology

Handbook of Thin Film Technology
Author : Hartmut Frey,Hamid R. Khan
Publisher : Springer Science & Business Media
Release Date : 2015-05-06
Category : Technology & Engineering
Total pages :380
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“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Handbook of Ion Beam Processing Technology

Handbook of Ion Beam Processing Technology
Author : Jerome J. Cuomo,Stephen M. Rossnagel,Harold R. Kaufman,Stephen M. Haber
Publisher : William Andrew
Release Date : 1989
Category : Science
Total pages :438
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Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

Handbook of Hard Coatings

Handbook of Hard Coatings
Author : Rointan F. Bunshah,Christian Weissmantel
Publisher : Cambridge University Press
Release Date : 2001
Category : Science
Total pages :550
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Written by 12 leading experts, this is an essential resource for fabrication, characterization and applications in the field of hard coatings and wear resistant surfaces. Offering complete explanations of commercially oriented deposition technology, from traditional vacuum. Includes a detailed introduction to the science of characterizing and measuring hard coatings.

Handbook of Thin Film Deposition Processes and Techniques

Handbook of Thin Film Deposition Processes and Techniques
Author : Krishna Seshan
Publisher : William Andrew
Release Date : 2001-02-01
Category : Technology & Engineering
Total pages :430
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New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Thin Film Materials Technology

Thin Film Materials Technology
Author : Kiyotaka Wasa,Makoto Kitabatake,Hideaki Adachi
Publisher : William Andrew
Release Date : 2004-05-10
Category : Technology & Engineering
Total pages :532
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An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.

Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition
Author : Hugh O. Pierson
Publisher : William Andrew
Release Date : 2012-12-02
Category : Technology & Engineering
Total pages :458
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

The Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology
Author : Donald M. Mattox
Publisher : Springer Science & Business Media
Release Date : 2004-04-26
Category : Science
Total pages :150
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The Foundations of Vacuum Coating Technology is a concise review of the developments that have led to the wide variety of applications of this technology. This book is a must for materials scientists and engineers working with vacuum coating in the invention of new technologies or applications in all industries. With over 370 references, this is an excellent starting point for those who don’t want to reinvent the wheel. In particular, the book is a valuable reference for those interested in researching proposed or existing patents. This unique book provides a starting point for more in-depth surveys of past and recent work in all aspects of vacuum coating. The author uses his extensive knowledge of the subject to draw comparisons and place the information into the proper context. This is particularly important for the patent literature where the terminology does not always match industry jargon. A section of acronyms for vacuum coating and glossary of terms at the end of the book are critical additions to the information every reader needs.

Optical Thin Films

Optical Thin Films
Author : James D. Rancourt
Publisher : SPIE Press
Release Date : 1996
Category : Technology & Engineering
Total pages :289
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Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

Handbook of Optical Properties

Handbook of Optical Properties
Author : Rolf E. Hummel,Karl H. Guenther
Publisher : CRC Press
Release Date : 1995-02-24
Category : Science
Total pages :384
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Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.