January 27, 2021

Download Ebook Free Laser Annealing Processes In Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology
Author : Fuccio Cristiano,Antonino La Magna
Publisher : Woodhead Publishing
Release Date : 2021-03-15
Category : Technology & Engineering
Total pages :325
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Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Laser Annealing of Semiconductors

Laser Annealing of Semiconductors
Author : J Poate
Publisher : Elsevier
Release Date : 2012-12-02
Category : Technology & Engineering
Total pages :576
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Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9

Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9
Author : F. Roozeboom,P. J. Timans,K. Kakushima,E. Gusev,Z. Karim,D. Misra,Y. S. Obeng,S. De Gendt,H. Jagannathan
Publisher : The Electrochemical Society
Release Date : 2019-05-17
Category : Science
Total pages :176
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This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.

Semiconductor Technology (ISTC 2001)

Semiconductor Technology (ISTC 2001)
Author : Ming Yang
Publisher : Unknown
Release Date : 2001
Category : Semiconductors
Total pages :1273
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Ion Implantation in Semiconductors 1976

Ion Implantation in Semiconductors 1976
Author : Fred Chernow
Publisher : Springer Science & Business Media
Release Date : 2012-12-06
Category : Science
Total pages :754
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The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done.

Laser-Assisted Microtechnology

Laser-Assisted Microtechnology
Author : Simeon M. Metev,Vadim P. Veiko
Publisher : Springer Science & Business Media
Release Date : 2013-03-09
Category : Technology & Engineering
Total pages :270
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Laser-Assisted Microtechnology introduces the principles and techniques of laser-assisted microtechnology with emphasis on micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The experimental and theoretical physico-chemical basis of every technological process is presented in detail. On the basis of some characteristic examples of applications, the capabilities of the technological methods as well as the optimum conditions for their realization are discussed. In this second edition, besides the actualization of the literature, a new chapter concerning the laser-assisted wet chemical micro etching, has been added. This is a new method for direct 3D-micro structuring of solids, with a number of potential applications.

Laser Applications in Surface Science and Technology

Laser Applications in Surface Science and Technology
Author : Horst-Günter Rubahn
Publisher : John Wiley & Sons
Release Date : 1999-03-17
Category : Science
Total pages :346
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Lasers are becoming increasingly important in surface science, both for the diagnostic evaluation and the processing of surfaces, for example, higher harmonic generation for diagnosis and the widespread use of laser surface microstructuring and annealing for processing. The physics behind such applications might be described in some cases by simple heating and melting processes, but can also include much more complex phenomena such as plasma generation or elementary collective surface excitations. Laser Applications in Surface Science and Technology provides an overview of the different techniques, discusses the principles behind them and gives a concise description of laser-induced and laser-detected processes on surfaces. Recent developments in the field such as nonlinear surface spectroscopies and the interactions of ultrashort pulses with materials, are also introduced. Invaluable reading for postgraduate students and research scientists across a wide range of disciplines including: physics, chemistry, electronic engineering and materials science.

Laser Technology

Laser Technology
Author : Anonim
Publisher : Unknown
Release Date : 1993
Category : Lasers
Total pages :129
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Nanoscience and Technology

Nanoscience and Technology
Author : Chun Li Bai,Si Shen Xie,Xing Zhu
Publisher : Trans Tech Publications Ltd
Release Date : 2007-03-15
Category : Technology & Engineering
Total pages :1600
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Volume is indexed by Thomson Reuters CPCI-S (WoS). Nanotechnology has been a priority research field in many countries, because new discoveries in this field have the potential power to unravel new phenomena and new principles of materials use. This collection of knowledge concerning frontier issues in nanotechnology will aid the further promotion of the integration of nanotechnology and industry.

Microelectronics Technology and Devices

Microelectronics Technology and Devices
Author : Cor L. Claeys
Publisher : The Electrochemical Society
Release Date : 2005
Category : Science
Total pages :560
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Laser Induced Damage in Optical Materials

Laser Induced Damage in Optical Materials
Author : Anonim
Publisher : Unknown
Release Date : 1993
Category : Laser materials
Total pages :129
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Rapid Thermal Processing for Future Semiconductor Devices

Rapid Thermal Processing for Future Semiconductor Devices
Author : H. Fukuda
Publisher : Elsevier
Release Date : 2003-04-02
Category : Science
Total pages :160
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This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices. This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.

Laser Technology 4

Laser Technology 4
Author : Wiesław Woliński,Zdzisław Jankiewicz,Politechnika Szczecińska
Publisher : Society of Photo Optical
Release Date : 1995
Category : Medical
Total pages :626
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Microelectronics Technology and Devices - SBMicro 2009

Microelectronics Technology and Devices - SBMicro 2009
Author : Davies William de Lima Monteiro,O. Bonnaud,N. Morimoto
Publisher : The Electrochemical Society
Release Date : 2009-08-01
Category : Electrochemistry
Total pages :623
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This issue of ECS Transactions features eight invited and sixty-seven regular papers on technology, devices, systems, optoelectronics, modeling and characterization; all either directly or indirectly related to microelectronics. The topics presented herein reveal the multidisciplinary character of this field, which definitely incites the highly cooperative trace of human nature.

Rapid Thermal Processing and beyond: Applications in Semiconductor Processing

Rapid Thermal Processing and beyond: Applications in Semiconductor Processing
Author : Wielfried Lerch,Jürgen Niess
Publisher : Trans Tech Publications Ltd
Release Date : 2008-03-24
Category : Technology & Engineering
Total pages :448
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Heat-treatment and thermal annealing are very common processing steps which have been employed during semiconductor manufacturing right from the beginning of integrated circuit technology. In order to minimize undesired diffusion, and other thermal budget-dependent effects, the trend has been to reduce the annealing time sharply by switching from standard furnace batch-processing (involving several hours or even days), to rapid thermal processing involving soaking times of just a few seconds. This transition from thermal equilibrium, to highly non-equilibrium, processing was very challenging and is still a field ripe for further development.